Document Details

Document Type : Article In Journal 
Document Title :
A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure
A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure
 
Subject : Physics 
Document Language : English 
Abstract : Two sets of hydrogenated microcrystalline silicon thin-film samples were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique at different deposition conditions of excited power and pressure. The correlation between the crystalline volume fraction for the samples determined from Raman spectra and the excited power, pressure, absorption coefficient, refractive index and optical energy gap was discussed. The values of optical parameters (refractive index and absorption coefficient), were calculated from the transmission spectra in the range 400-2500 nm. The optical band energy gap and Urbach energy were obtained using the calculated values of absorption coefficients. © 2009 Elsevier Ltd. All rights reserved. 
ISSN : 0042-207X 
Journal Name : Vacuum 
Volume : 83 
Issue Number : 7 
Publishing Year : 2009 AH
2009 AD 
Number Of Pages : 7 
Article Type : Article 
Added Date : Tuesday, October 13, 2009 

Researchers

Researcher Name (Arabic)Researcher Name (English)Researcher TypeDr GradeEmail
رشاد بدرانBadran, R.I.ResearcherDoctoraterbadran@hau.edu.sa
فرج الحازميAl-Hazmi, F.S.ResearcherDoctorateFalhazmi@kau.edu.sa
صالح الحنيطيAl-Heniti, S.ResearcherDoctoratesheniti@kau.edu.sa
أحمد عبدالله الغامديAl-Ghamdi, A.AResearcherDoctorateAGAMDI@kau.edu.sa
Li, J.Li, J.ResearcherDoctorate 
Xiong, SXiong, SResearcherDoctorate 

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